ELPESOLAR® products for photovoltaics are applied for imaging and insulation in the solar technology.

Due to decades of experience with the development of etch and plating resists for highest requirements to resolution for representing ultrafine structures, Lackwerke Peters GmbH + Co KG has proved to be a good partner for the photovoltaic industry.

Etch resists, such as SD 2052 AL are distinguished by good resistance to acid and alkaline etching baths up to pH 9, also to hydrofluoric acid, and can be used for imaging and etching processes for silicon substrates or glass. The etch resists of the series SD 2052 AL are physically drying resists that are applied by screen printing and stripped in alkaline media.