CTS offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with many other commercially available photoresist products.
ADHESION PROMOTER / RELEASE LAYER |
|
Product name |
Product function |
OmniCoat |
Adhesion promoter |
MCC Primer 80/20 |
Adhesion promoter |
Primer HMDS |
Adhesion promoter |
PHOTORESIST THINNERS |
|
Product name |
Product function |
SU-8 2000 thinner |
to dilute SU-8 2000 resists |
T thinner |
to dilute PMGI SF resists |
G thinner |
to dilute PMGI and LOR SFG resists |
A thinner |
to dilute PMMA A resists |
C thinner |
to dilute PMMA C resists |
EL thinner |
to dilute copolymer resists |
EC Solvant |
to dilute PGMEA photoresists |
EC Solvant 11 |
to dilute Ethyl lactate photoresists |
EDGE BEAD REMOVER |
|
Product name |
Product function |
EBR PG |
edge bead removal, equipment cleanup |
DEVELOPERS |
|
Product name |
Product function |
PMGI 101 developer |
PMGI resist development |
SU-8 developer |
SU-8 & SU-8 2000 resist development |
MIBK :IPA 1 :1 |
High speed PMMA & copolymer resist development |
MIBK :IPA 1 :2 |
PMMA & copolymer resist development |
MIBK :IPA 1 :3 |
High resolution PMMA & copolymer resist development |
MF319 |
TMAH, develop most photoresists |
MF26A |
TMAH, develop most photoresists |
Microposit developer concentrate |
MIB, develop most photoresists |
REMOVAL |
|
Product name |
Product function |
Remover PG |
to strip SU-8, PMGI, LOR & PMMA resists |
1165 |
remove most resins |
SVC14 |
remove most resins |