CTS offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with many other commercially available photoresist products.
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ADHESION PROMOTER / RELEASE LAYER |
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Product name |
Product function |
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OmniCoat |
Adhesion promoter |
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MCC Primer 80/20 |
Adhesion promoter |
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Primer HMDS |
Adhesion promoter |
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PHOTORESIST THINNERS |
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Product name |
Product function |
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SU-8 2000 thinner |
to dilute SU-8 2000 resists |
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T thinner |
to dilute PMGI SF resists |
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G thinner |
to dilute PMGI and LOR SFG resists |
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A thinner |
to dilute PMMA A resists |
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C thinner |
to dilute PMMA C resists |
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EL thinner |
to dilute copolymer resists |
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EC Solvant |
to dilute PGMEA photoresists |
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EC Solvant 11 |
to dilute Ethyl lactate photoresists |
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EDGE BEAD REMOVER |
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Product name |
Product function |
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EBR PG |
edge bead removal, equipment cleanup |
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DEVELOPERS |
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Product name |
Product function |
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PMGI 101 developer |
PMGI resist development |
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SU-8 developer |
SU-8 & SU-8 2000 resist development |
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MIBK :IPA 1 :1 |
High speed PMMA & copolymer resist development |
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MIBK :IPA 1 :2 |
PMMA & copolymer resist development |
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MIBK :IPA 1 :3 |
High resolution PMMA & copolymer resist development |
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MF319 |
TMAH, develop most photoresists |
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MF26A |
TMAH, develop most photoresists |
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Microposit developer concentrate |
MIB, develop most photoresists |
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REMOVAL |
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Product name |
Product function |
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Remover PG |
to strip SU-8, PMGI, LOR & PMMA resists |
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1165 |
remove most resins |
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SVC14 |
remove most resins |