CTS offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with many other commercially available photoresist products.

ADHESION PROMOTER / RELEASE LAYER

Product name

Product function

OmniCoat

Adhesion promoter

MCC Primer 80/20

Adhesion promoter

Primer HMDS

Adhesion promoter

PHOTORESIST THINNERS

Product name

Product function

SU-8 2000 thinner

to dilute SU-8 2000 resists

T thinner

to dilute PMGI SF resists

G thinner

to dilute PMGI and LOR SFG resists

A thinner

to dilute PMMA A resists

C thinner

to dilute PMMA C resists

EL thinner

to dilute copolymer resists

EC Solvant

to dilute PGMEA photoresists

EC Solvant 11

to dilute Ethyl lactate photoresists

EDGE BEAD REMOVER

Product name

Product function

EBR PG

edge bead removal, equipment cleanup

DEVELOPERS

Product name

Product function

PMGI 101 developer

PMGI resist development

SU-8 developer

SU-8 & SU-8 2000 resist development

MIBK :IPA 1 :1

High speed PMMA & copolymer resist development

MIBK :IPA 1 :2

PMMA & copolymer resist development

MIBK :IPA 1 :3

High resolution PMMA & copolymer resist development

MF319

TMAH, develop most photoresists

MF26A

TMAH, develop most photoresists

Microposit developer concentrate

MIB, develop most photoresists

REMOVAL

Product name

Product function

Remover PG

to strip SU-8, PMGI, LOR & PMMA resists

1165

remove most resins

SVC14

remove most resins