Nom

Description

Développeur

RESOLVE 9033R

- Développeur film sec et masque de soudure haute concentration

- Excellent rendement

Stripeur

SURFACESTRIP419

- Haute vitesse de stripage

- Pas d’oxydation pour optimiser inspection AOI

SURFACESTRIP715

Excellente performance de stripage en petites particules. Filtre cyclone nécessaire.

Inline system for processing liquid, dry, ED and metal resists for inner and outer layers

- Development without de-foaming thanks to an optimised bath guidance
- Controlled dosing of the developer solution in the post developer guarantees optimised development processes and reliable removal of unexposed resists
- High etching quality with high etching factor using the FineLine spray system
- Consistent etching structure without "puddle effects" due to intermittent etching with single-nozzle control
- Innovative filter technology for the stripping process adjusted to the type of resist
- Transport systems adaptable to all PCB formats
- Tank station (optional) makes it possible to work with two different chemicals in one machine
- Fully automatic dosing system