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CTS offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with many other commercially available photoresist products.
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ADHESION PROMOTER / RELEASE LAYER
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Product name
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Product function
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OmniCoat
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Adhesion promoter
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MCC Primer 80/20
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Adhesion promoter
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Primer HMDS
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Adhesion promoter
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PHOTORESIST THINNERS
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Product name
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Product function
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SU-8 2000 thinner
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to dilute SU-8 2000 resists
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T thinner
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to dilute PMGI SF resists
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G thinner
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to dilute PMGI and LOR SFG resists
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A thinner
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to dilute PMMA A resists
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C thinner
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to dilute PMMA C resists
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EL thinner
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to dilute copolymer resists
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EC Solvant
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to dilute PGMEA photoresists
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EC Solvant 11
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to dilute Ethyl lactate photoresists
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EDGE BEAD REMOVER
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Product name
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Product function
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EBR PG
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edge bead removal, equipment cleanup
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DEVELOPERS
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Product name
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Product function
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PMGI 101 developer
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PMGI resist development
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SU-8 developer
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SU-8 & SU-8 2000 resist development
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MIBK :IPA 1 :1
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High speed PMMA & copolymer resist development
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MIBK :IPA 1 :2
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PMMA & copolymer resist development
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MIBK :IPA 1 :3
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High resolution PMMA & copolymer resist development
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MF319
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TMAH, develop most photoresists
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MF26A
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TMAH, develop most photoresists
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Microposit developer concentrate
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MIB, develop most photoresists
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REMOVAL
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Product name
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Product function
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Remover PG
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to strip SU-8, PMGI, LOR & PMMA resists
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1165
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remove most resins
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SVC14
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remove most resins
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