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PMGI SF - For Lift-off, microlens,
multilayers and planarization
| PMGI SF |
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- Sensitivity from 240 to 280 nm in DUV, E-Beam or X-Ray,
- Sub-micron resolution,
- Highly controllable undercut profile,
- No interlevel mixing with conventional Novalak, PVP or PMMA based
resists,
- Development with aqueous solution,
- Higher dry etch resistance than PMMA resists,
- Little or no shrinkage,
- From 0,1 to 12 microns thickness in a single pass,
- Good dielectric properties,
- Excellent optical transparency and stability,
- Chemically stable at 350 °C,
- 190 °C Tg.
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Other products available : Remover PG, Acryl
Strip, EBR PG
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