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NANO PMMA - Positive resist for E-Beam / X
Ray
| PMMA - Poly(methylmethacrylate) |
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- Available with standard molecular weights of 495 and 950K thousand
in anisole or chlorobenzene,
- Also available with moecular weights of 50K, 100K,
200K & 2,2M, for special application or instead of copolymer,
- Excellent resolution,
- Very high thermal stability,
- 105 °C Tg.
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| Copolymer Nano MMA (8.5) MAA |
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- 8,5 % methacrylic acid contnets,
- Typically use in multilayer applications with a higher dissolution
rate than most PMMA resists,
- Excellent for sub-half micron resolution,
- Solution made in ethyl lactate in both standard and custom
dilutions,
- 55 °C Tg.
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| Copolymer Nano MMA (17.5) MAA |
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- 17,5 % methacrylic acid contents,
- Typically use in multilayer applications with a higher dissolution
rate than most PMMA resists,
- Excellent for sub-half micron resolution,
- Solution made in ethyl lactate in both standard and custom
dilutions,
- 55 °C Tg.
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| Developer for PMMA and Copolymer NANO |
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- Developer MIBK,
- Several dilutions MIBK / IPA available,
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Other products available : Remover PG, Acryl
Strip, EBR PG
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